{"id":357,"date":"2023-03-28T15:51:44","date_gmt":"2023-03-28T06:51:44","guid":{"rendered":"https:\/\/hkd.co.jp\/wordpress\/?page_id=357"},"modified":"2023-10-13T19:50:31","modified_gmt":"2023-10-13T10:50:31","slug":"corp_his","status":"publish","type":"page","link":"https:\/\/hkd.co.jp\/english\/company\/corp_his\/","title":{"rendered":"History"},"content":{"rendered":"\n

History<\/strong><\/h1>\n\n\n\n
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The history of Koden is the history of sensor technology itself.<\/p>\n\n\n\n

Based on our achievements and trust, we will continue to run at the forefront of the electronic technology demanded by the next generation.<\/p>\n<\/div>\n\n\n\n

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1967<\/strong>.04<\/strong><\/p>\n<\/div>\n\n\n\n

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Established as an affiliated company of Hamamatsu Photonics K.K.
Started production of visible light conductive elements at the Asada Factory (Minami Asada, Hamamatsu City)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1974.02<\/strong><\/p>\n<\/div>\n\n\n\n

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Opened Tenryu Factory (Aoya-cho, Hamamatsu City)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1974.12<\/strong><\/p>\n<\/div>\n\n\n\n

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Increased capital to 10 million yen<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1974<\/strong><\/p>\n<\/div>\n\n\n\n

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Research and development of UV detectors using reactive sputtering (research assistance by the Ministry of International Trade and Industry)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1978.03<\/strong><\/p>\n<\/div>\n\n\n\n

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Opened Ryuyo Plant (Miyamoto, Ryuyo-cho, Iwata-gun)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1978.08<\/strong><\/p>\n<\/div>\n\n\n\n

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Increased capital to 22 million yen<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1979<\/strong><\/p>\n<\/div>\n\n\n\n

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Research on DIP-type photocouplers (research assistance from the Ministry of International Trade and Industry)<\/p>\n\n\n\n

Photoconductive semiconductor printing method research (Shizuoka prefecture research assistance)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1980.01<\/strong><\/p>\n<\/div>\n\n\n\n

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Patent acquired for the method of forming a photoconductor layer.<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1980.03<\/strong><\/p>\n<\/div>\n\n\n\n

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Constructed the Ryuyo 2 Buildings and started manufacturing silicon photodiodes.<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1980.04<\/strong><\/p>\n<\/div>\n\n\n\n

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Started production of hybrid ICs<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1980.08<\/strong><\/p>\n<\/div>\n\n\n\n

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Increased capital to 35 million yen<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1981<\/strong><\/p>\n<\/div>\n\n\n\n

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Research on amorphous silicon photoconductive devices (Ministry of International Trade and Industry research assistance)
Research and development of DIP-type zero-cross built-in solid-state relay (Shizuoka prefecture research subsidy)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1984.04<\/strong><\/p>\n<\/div>\n\n\n\n

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Headquarters building completed and relocated to Ryuyo factory site (Miyamoto, Ryuyo-cho, Iwata-gun)<\/p>\n\n\n\n

Increased capital to 58 million yen<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1984.05<\/strong><\/p>\n<\/div>\n\n\n\n

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Completion of Ryuyo 3rd building<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1984<\/strong><\/p>\n<\/div>\n\n\n\n

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Development of an amorphous silicon photodiode array (research assistance from the Ministry of International Trade and Industry)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1985.07<\/strong><\/p>\n<\/div>\n\n\n\n

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Opened Tokyo office<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1985.10<\/strong><\/p>\n<\/div>\n\n\n\n

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Started production of ferromagnetic thin film resistance elements (AMR sensors)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1985.12<\/strong><\/p>\n<\/div>\n\n\n\n

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Closed the Tenryu factory and integrated it into the Ryuyo headquarters factory.<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1988.08<\/strong><\/p>\n<\/div>\n\n\n\n

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Started production of water level sensors<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1991.07<\/strong><\/p>\n<\/div>\n\n\n\n

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Established employee shareholding association<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1991.09<\/strong><\/p>\n<\/div>\n\n\n\n

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Increased capital to 79.5 million yen<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1992.05<\/strong><\/p>\n<\/div>\n\n\n\n

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Opened Fukude Factory (Fukude, Fukude-cho, Iwata-gun)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1995.01<\/strong><\/p>\n<\/div>\n\n\n\n

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Completion of a new factory connecting two Ryuyo buildings<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1998.02<\/strong><\/p>\n<\/div>\n\n\n\n

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Acquired ISO9001 certification<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1998.03<\/strong><\/p>\n<\/div>\n\n\n\n

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Started production of semiconductor pressure sensors<\/p>\n<\/div>\n<\/div>\n\n\n\n

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1999.11<\/strong><\/p>\n<\/div>\n\n\n\n

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Completion of buildings 4th and 5th<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2002.06<\/strong><\/p>\n<\/div>\n\n\n\n

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Established Hamamatsu Kohden Hong Kong Co., Ltd. as an affiliated company<\/p>\n\n\n\n

Started manufacturing at partner company in Shenzhen<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2003.12<\/strong><\/p>\n<\/div>\n\n\n\n

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Acquired ISO14001 certification<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2005.04<\/strong><\/p>\n<\/div>\n\n\n\n

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Headquarters and Fukude factory addresses changed due to merger of municipalities
(Headquarters Factory: 249-9 Miyamoto, Iwata City, Fukude Factory: 5498 Fukude, Iwata City)<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2006.10<\/strong><\/p>\n<\/div>\n\n\n\n

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Discontinued production of visible light conductive elements<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2008.04<\/strong><\/p>\n<\/div>\n\n\n\n

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Completed a new building at the head office factory and started manufacturing<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2008.07<\/strong><\/p>\n<\/div>\n\n\n\n

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Moved factory from Shenzhen to Dongguan<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2012.03<\/strong><\/p>\n<\/div>\n\n\n\n

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Clean room expansion<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2017.05<\/strong><\/p>\n<\/div>\n\n\n\n

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Completed 6th buildings\/started production at the head office factory<\/p>\n<\/div>\n<\/div>\n\n\n\n

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2022.07<\/strong><\/p>\n<\/div>\n\n\n\n

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Started handling TMR sensors from MultiDimension Technology Co., Ltd.<\/p>\n<\/div>\n<\/div>\n\n\n\n

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