Corporate Profile
The history of Koden is the history of sensor technology itself.
Based on our achievements and trust, we will continue to run at the forefront of the electronic technology demanded by the next generation.
1967.04
Established as an affiliated company of Hamamatsu Photonics K.K.
Started production of visible light conductive elements at the Asada Factory (Minami Asada, Hamamatsu City)
1974.02
Opened Tenryu Factory (Aoya-cho, Hamamatsu City)
1974.12
Increased capital to 10 million yen
1974
Research and development of UV detectors using reactive sputtering (research assistance by the Ministry of International Trade and Industry)
1978.03
Opened Ryuyo Plant (Miyamoto, Ryuyo-cho, Iwata-gun)
1978.08
Increased capital to 22 million yen
1979
Research on DIP-type photocouplers (research assistance from the Ministry of International Trade and Industry)
Photoconductive semiconductor printing method research (Shizuoka prefecture research assistance)
1980.01
Patent acquired for the method of forming a photoconductor layer.
1980.03
Constructed the Ryuyo 2 Buildings and started manufacturing silicon photodiodes.
1980.04
Started production of hybrid ICs
1980.08
Increased capital to 35 million yen
1981
Research on amorphous silicon photoconductive devices (Ministry of International Trade and Industry research assistance)
Research and development of DIP-type zero-cross built-in solid-state relay (Shizuoka prefecture research subsidy)
1984.04
Headquarters building completed and relocated to Ryuyo factory site (Miyamoto, Ryuyo-cho, Iwata-gun)
Increased capital to 58 million yen
1984.05
Completion of Ryuyo 3rd building
1984
Development of an amorphous silicon photodiode array (research assistance from the Ministry of International Trade and Industry)
1985.07
Opened Tokyo office
1985.10
Started production of ferromagnetic thin film resistance elements (AMR sensors)
1985.12
Closed the Tenryu factory and integrated it into the Ryuyo headquarters factory.
1988.08
Started production of water level sensors
1991.07
Established employee shareholding association
1991.09
Increased capital to 79.5 million yen
1992.05
Opened Fukude Factory (Fukude, Fukude-cho, Iwata-gun)
1995.01
Completion of a new factory connecting two Ryuyo buildings
1998.02
Acquired ISO9001 certification
1998.03
Started production of semiconductor pressure sensors
1999.11
Completion of buildings 4th and 5th
2002.06
Established Hamamatsu Kohden Hong Kong Co., Ltd. as an affiliated company
Started manufacturing at partner company in Shenzhen
2003.12
Acquired ISO14001 certification
2005.04
Headquarters and Fukude factory addresses changed due to merger of municipalities
(Headquarters Factory: 249-9 Miyamoto, Iwata City, Fukude Factory: 5498 Fukude, Iwata City)
2006.10
Discontinued production of visible light conductive elements
2008.04
Completed a new building at the head office factory and started manufacturing
2008.07
Moved factory from Shenzhen to Dongguan
2012.03
Clean room expansion
2017.05
Completed 6th buildings/started production at the head office factory
2022.07
Started handling TMR sensors from MultiDimension Technology Co., Ltd.